MINILAB

  • MINILAB

  • The MINILAB is equipped with a spin coater, hot plate, DI Water system and process bath. This equipment can be effectively perform Photo-lithography process for piece to 4 inch sample from University and Research center.

    • Spin Coater System (SPIN-1200T)
    - Piece ~ 4 inch wafer
    - 300~7000rpm ±3% (@ No load )
    - 50steps, 50 Recipes (Save & load)
    - Time : 0.1~999.9sec (Programmable)
    - Acceleration/Deceleration rates : Variable Time (0.1sec step)
    - Touch control system
    - Dimension : 230 x 340 x 265 (mm)

    • Hot Plate
    - PID Control
    - Max. ~ 350C˚
    - Dimension : 240 x 280x 90 (mm)

    • D.I water system
    - LED Display
    - 10L/Hr
    - 0~25 ㎲/cm
    - 20L tank
    - Dimension : 350 x 350 x 500 (mm)
Photo-litho / Wet Process - MINILAB
  • specification
Composition Spin Coater, Hot plate, D.I water system
Dimesion(mm) 1000(W) x 560(D) x 1630(H)
etc. Drain line
Drain tank
exhaust
N2 gun
DI water gun
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