MDA-40FA

  • MDA-40FA

  • Easy operation UI
    PC Operation with PLC control
    Image grab & Data log
    More than 100 Program recipes
    Microscope position control system
    Auto Align mark searching function
Photo-litho / Exposure System / Auto - MDA-40FA
  • specification
Type Full automatic (Mask Aligner)
Mask size up to 7" x 7"
Substrate size up to 6"
UV lamp & Power 350W & power supply
Uniform beam size 6.25" x 6.25"
Beam Uniformity <±3%
Beam wavelength 350 ~ 450nm
365nm Intensity ~25mW/cm2
Alignment accuracy 1um
Process resolution 1um@1um PR thickness with vacuum contact
Process mode Soft, Hard, Vacuum contact & Proximity
Substrate chuck moving x,y,z & θ (Motorized)
Pre-aligner ±50um
Frame Anti-Vibration system
Options UV Intensity meter
UV-LED(365nm) exposure module
etc.
Easy operation UI
PC Operation with PLC control
Image grab & Data log
More than 100 Program recipes
Microscope position control system
Auto Align mark searching function
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