• MDA-600S

  • Easy operation & Installation
    PC Operation with PLC control
    Compact size semi auto system
    Image grab & Data log
    More than 100 Program recipes
Photo-litho / Exposure System / Manual - MDA-600S
  • specification
Type PC control semi auto
Mask size up to 7" x 7"
Substrate size piece to 6"
UV lamp & Power 350W & power supply
Uniform beam size 6.25" x 6.25"
Beam Uniformity <±4%
Beam wavelength 350 ~ 450nm
365nm Intensity ~25mW/cm2
Alignment accuracy 1um
Process resolution 0.8um@1um PR thickness with vacuum contact
Process mode Soft, Hard, Vacuum contact & Proximity
Substrate chuck moving x,y,z & θ
Options Anti-Vibration table
UV Intensity meter
UV-LED(365nm) exposure module