MDA-400M

  • MDA-400M

  • Easy operation & Installation
    Handling Substrates of Various sizes
    PLC control with Touch screen panel
Photo-litho / Exposure System / Manual - MDA-400M
  • specification
Type Fully manual (Mask Aligner)
Mask size up to 5" x 5"
Substrate size piece to 4" dia
UV lamp & Power 350W & power supply
Uniform beam size 4.25" x 4.25"
Beam Uniformity <±3%
Beam wavelength 350 ~ 450nm
365nm Intensity ~30mW/cm2
Alignment accuracy 1um
Process resolution 1um@1um PR thickness with vacuum contact
Process mode Soft, Hard, Vacuum contact & Proximity
Substrate chuck moving x,y,z & θ
Options Anti-Vibration table
UV Intensity meter
etc.
Easy operation & Installation
Handling Substrates of Various sizes
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