MDA-400LJ

  • MDA-400LJ

  • Easy operation & Installation
    Handling Substrates of Various sizes
    Adopt UV-LED exposure module
    UV-LED Life-time is long
Photo-litho / Exposure System / Manual - MDA-400LJ
  • specification
Type Fully manual (Mask Aligner)
Mask size up to 5" x 5"
Substrate size piece to 4" dia
UV lamp & Power UV-LED & power supply
Uniform beam size 125mm dia
Beam Uniformity <±3%
Beam wavelength 365nm Only
365nm Intensity ~20mW/cm2
Alignment accuracy 1um
Process resolution 1um@1um PR thickness with vacuum contact
Process mode Soft, Hard, Vacuum contact & Proximity
Substrate chuck moving x,y,z & θ
Options etc.
Easy operation & Installation
Handling Substrates of Various sizes
Adopt UV-LED exposure module
UV-LED Life-time is long
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