MDA-150 (M)

  • MDA-150 (M)

  • Easy operation UI
    PC Operation with PLC control
    Image grab & Data log
    More than 100 Program recipes
Photo-litho / Exposure System / Manual - MDA-150 (M)
  • specification
Type Manual (Mask Aligner)
Mask size up to 7" x 7"
Substrate size piece to 6"
UV lamp & Power 500W, 1kW & Digital power supply
Uniform beam size 6.25" x 6.25
Beam Uniformity <±5%
Beam wavelength 350 ~ 450nm
365nm Intensity ~50mW/cm2
Alignment accuracy 1um
Process resolution 1um@1um PR thickness with vacuum contact
Process mode Soft, Hard, Vacuum contact & Proximity
Substrate chuck moving x,y,z & θ (motorized)
Options CCD BSA
Easy operation UI
PC Operation with PLC control
Image grab & Data log
More than 100 Program recipes
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