MDA-12SA

  • MDA-12SA

  • Easy operation UI
    PC Operation with PLC control
    Image grab & Data log
    More than 100 Program recipes
    Motorized joystick control
    Microscope position control system
    Enable Ceramic substrate for Bump
Photo-litho / Exposure System / Manual - MDA-12SA
  • specification
Type Joystick control Semi-Auto (Mask Aligner)
Mask size up to 13" x 13"
Substrate size piece to 12" x 12"
UV lamp & Power 2kW & power supply
5kW & Power supply
Uniform beam size 13.25" x 13.25"
Beam Uniformity <±5%
Beam wavelength 350 ~ 450nm
365nm Intensity 15 ~ 20mW/cm2 (2kW)
25 ~ 60mW/cm2 (5kW)
Alignment accuracy 1um
Process resolution 1um@1um PR thickness with vacuum contact
Process mode Soft, Hard, Vacuum contact & Proximity
Substrate chuck moving x,y,z & θ (Motorized)
Frame Anti-Vibration system
Options CCD BSA
UV Intensity meter
etc.
Easy operation UI
PC Operation with PLC control
Image grab & Data log
More than 100 Program recipes
Motorized joystick control
Microscope position control system
Enable Ceramic substrate for Bump
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