MDA-60MS

  • MDA-60MS

  • Easy operation & Installation
    PC Operation with PLC control
    Image grab & Data log
    More than 100 Program recipes
Photo-litho / Exposure System / Manual - MDA-60MS
  • specification
Type PC control semi auto
Mask size up to 7" x 7"
Substrate size piece to 6" x 6"
UV lamp & Power 1kW & power supply
Uniform beam size 7.25" x 7.25"
Beam Uniformity <±5%
Beam wavelength 350 ~ 450nm
365nm Intensity 15 ~ 25mW/cm2
Alignment accuracy 1um
Process resolution 1um@1um PR thickness with vacuum contact
Process mode Soft, Hard, Vacuum contact & Proximity
Substrate chuck moving x,y(Manual), z, θ (Motorized)
Options CCD BSA
UV Intensity meter
etc.
Frame Anti vibration table
Easy operation & Installation
PC Operation with PLC control
Image grab & Data log
More than 100 Program recipes
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